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Fabrication of polymeric microstructures with high aspect ratios using shrinkable polystyrene films
Author(s) -
Zhao XiaoMei,
Xia Younan,
Qin Dong,
Whitesides George M.
Publication year - 1997
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19970090316
Subject(s) - materials science , polystyrene , fabrication , reactive ion etching , composite material , aspect ratio (aeronautics) , microstructure , etching (microfabrication) , nanotechnology , polymer , layer (electronics) , medicine , alternative medicine , pathology
High‐aspect‐ratio polymeric structures have been fabricated using a process that combines reactive ion etching (RIE) and stress‐oriented, shrinkable polystyrene films. It is reported how, after pattering of the surface of the polystyrene film by RIE, heating of the film caused it to shrink by a factor of 4–5 in the lateral dimensions while the thickness of the film and the features on it increased by a factor of ∼20 (see Figure). Fig.