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Parallel patterning with nanochannel glass replica membranes
Author(s) -
Pearson Douglas H.,
Tonucci Ronald J.
Publication year - 1996
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19960081222
Subject(s) - membrane , materials science , replica , wafer , shadow mask , etching (microfabrication) , reactive ion etching , nanotechnology , chemical vapor deposition , deposition (geology) , optics , chemistry , art , paleontology , biochemistry , physics , layer (electronics) , sediment , visual arts , biology
Nanochannel glass replica membranes , a recent invention, can be used for parallel patterning of substrates, for example as a shadow mask in reactive ion etching. The preparation of the membranes—formed by physical vapor deposition on wafers that have been cut from bundles of two types of glass fibers that are repeatedly drawn down to the correct dimensions—their uses and their advantages are described. How the size, position, geometric pattern, and packing density of the voids in the membranes can be controlled to a high degree is outlined.