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AFM studies of the initial stages of spin‐coated prepolymer film growth on silicon wafers
Author(s) -
Gesang Thomas,
Höper Ralf,
Possart Wulf,
Petermann Jürgen,
Hennemann OttoDiedrich
Publication year - 1996
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19960081014
Subject(s) - materials science , prepolymer , wafer , layer (electronics) , microelectronics , silicon , spin coating , nanotechnology , atomic force microscopy , optoelectronics , thin film , composite material , polyurethane
Polymeric film growth on inorganic substrates plays an important role in the technology of sensors and microelectronics. A study of the film growth of a prepolymer of the dicyanate of bisphenol A (DCBA) spin‐coated onto silicon substrates is presented in which layer‐by‐layer growth is demonstrated. This mode of growth is thought to be related to an enrichment of the trimer (see Figure) including a triazine ring.