AFM studies of the initial stages of spin‐coated prepolymer film growth on silicon wafers | Zendy

Gesang Thomas | Zendy; Höper Ralf | Zendy; Possart Wulf | Zendy; Petermann Jürgen | Zendy; Hennemann OttoDiedrich | Zendy

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AFM studies of the initial stages of spin‐coated prepolymer film growth on silicon wafers

Author(s) -

Gesang Thomas,

Höper Ralf,

Possart Wulf,

Petermann Jürgen,

Hennemann OttoDiedrich

Publication year - 1996

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.19960081014

Subject(s) - materials science , prepolymer , wafer , layer (electronics) , microelectronics , silicon , spin coating , nanotechnology , atomic force microscopy , optoelectronics , thin film , composite material , polyurethane

Polymeric film growth on inorganic substrates plays an important role in the technology of sensors and microelectronics. A study of the film growth of a prepolymer of the dicyanate of bisphenol A (DCBA) spin‐coated onto silicon substrates is presented in which layer‐by‐layer growth is demonstrated. This mode of growth is thought to be related to an enrichment of the trimer (see Figure) including a triazine ring.

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