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A novel method for the preparation of nanosized tio 2 thin films
Author(s) -
Sberveglieri Giorgio,
Depero Laura E.,
Nelli Paolo,
Perego Cesare,
Sangaletti Luigi,
Ferroni Matteo,
Guidi Vincenzo,
Martinelli Giuliano
Publication year - 1996
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19960080410
Subject(s) - materials science , thin film , titanium dioxide , characterization (materials science) , sputter deposition , nanotechnology , layer (electronics) , sputtering , titanium , chemical engineering , optoelectronics , composite material , metallurgy , engineering
Nanostructured titanium dioxide has many important applications, including several in chemical sensors, for example in “electronic noses”. A new method of preparing nanosized TiO 2 thin films based on rf magnetron sputtering is reported and the characterization of the resulting films described. Results are presented for the temperature variation of the electrical response of the films to NO 2 , in particular the response and recovery times of the resistance of the layer.