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The Colloid Chemical Approach to Nanostructured Materials **
Author(s) -
Fendler Janos H.,
Meldrum Fiona C.
Publication year - 1995
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19950070703
Subject(s) - materials science , nanocrystalline material , colloid , nanoparticle , nanotechnology , monolayer , thin film , metal , chemical engineering , metallurgy , engineering
Nanocrystalline particulate films , dispersions of nanoparticles in monolayers in which the inter‐particle distances can be controlled, and systems containing nanoparticles incorporated between the head groups of organic thin films (see Fig.) produced using a wet colloid‐chemical approach are reviewed. Size‐quantized metallic, magnetic, and semiconducting particles are cosnidered and the development of nanostructured devices discussed.
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