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Promising new precursors for the CVD of gold
Author(s) -
Jansen Frank,
Kruck Thomas
Publication year - 1995
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19950070312
Subject(s) - materials science , chemical vapor deposition , deposition (geology) , nanotechnology , gold alloys , chemical engineering , metallurgy , paleontology , sediment , engineering , biology , alloy
High deposition rates for the CVD of gold at low temperatures are reported. The synthesis and use of methyl(alkyldimethoxyphosphine)gold(I) compounds in the chemical vapor deposition of gold (see Figure) is described, and the precursors are found to be easily handled in air, and to result in comparable deposition rates and higher yields compared to currently used materials.