Premium
Aerosol‐assisted chemical vapor deposition (AACVD) of silver, palladium and metal alloy (Ag 1−x Pd x , Ag 1−x Cu x and Pd 1−x Cu x ) Films
Author(s) -
Xu Chongying,
HampdenSmith Mark J.,
Kodas Toivo T.
Publication year - 1994
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19940061005
Subject(s) - palladium , materials science , chemical vapor deposition , alloy , aerosol , volatility (finance) , metal , thin film , deposition (geology) , inorganic chemistry , chemical engineering , metallurgy , analytical chemistry (journal) , nanotechnology , organic chemistry , catalysis , chemistry , economics , financial economics , engineering , paleontology , sediment , biology
Thermally labile, low‐volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high‐quality metal films. Here, a new method, aerosol‐assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors.