Premium
Plasma induced chemical vapor deposition of Zr(C,B) from CpZr(BH 4 ) 3 (Cp C 5 H 5 ⊖)
Author(s) -
Reich Silvia,
Messelhäuser Johannes,
Suhr Harald,
Erker Gerhard,
Fritze Cornelia
Publication year - 1994
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19940060912
Subject(s) - materials science , chemical vapor deposition , deposition (geology) , plasma , substrate (aquarium) , analytical chemistry (journal) , metal , plasma enhanced chemical vapor deposition , chemical engineering , metallurgy , nanotechnology , organic chemistry , paleontology , oceanography , physics , chemistry , quantum mechanics , sediment , geology , engineering , biology
The hardness of metal borides makes them suitable for applications as corrosion resistant and, in combination with other materials, as hard coatngs for cutting tools, for example. The plasma induced chemical vapor deposition of Zr(C,B) from the precursor CpZr(BH 4 ) 3 , where Cp is C 5 H 5 ⊖, is described and the results of an investigation of the dependence of the deposition rete and the film characteristics on the deposition parameters, e.g. the carrier gas and the substrate temperature, are presented.