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Monocrystalline Si 3 N 4 filaments
Author(s) -
Hüttinger Klaus J.,
Pieschnick Torsten W.
Publication year - 1994
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19940060113
Subject(s) - monocrystalline silicon , materials science , protein filament , chemical vapor deposition , silicon nitride , catalysis , silicon , spectral line , deposition (geology) , chemical engineering , nanotechnology , crystallography , optoelectronics , composite material , organic chemistry , chemistry , physics , astronomy , engineering , paleontology , sediment , biology
In the search for structural materials suitable for high temperatures . monocrystalline silicon nitride filaments have been synthesized by catalyzed chemical vapor deposition. Such a filament with a catalyst particle at the tip is shown in the Figure. The effect of various flow rates of N 2 /NH 3 and H 2 , the X‐ray emission spectra, and the mechanical properties of the filaments are presented.