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Ultrathin films of cellulose on silicon wafers
Author(s) -
Schaub Matthias,
Wenz Gerhard,
Wegner Gerhard,
Stein Andreas,
Klemm Dieter
Publication year - 1993
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19930051209
Subject(s) - materials science , cellulose , thin film , wafer , silicon , wetting , degradation (telecommunications) , chemical engineering , nanotechnology , composite material , optoelectronics , telecommunications , computer science , engineering
The first preparation of thin films of cellulose itself is reported. Cellulose exhibits excellent wetting behavior, is extremely stable against oxidation and other chemical degradation and in thin‐film form would have a number of applications. The method involves the preparation of LB films of trimethylcellulose (see Figure) and the in situ conversion of these thin films on silicon substrates to cellulose.