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Highly oriented poly(di‐ n ‐alkylsilylene) films on oriented PTFE substrates
Author(s) -
Frey Holger,
Sheiko Sergej,
Möller Martin,
Wittmann Jean Claude,
Lot Bernard
Publication year - 1993
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19930051208
Subject(s) - materials science , birefringence , fabrication , dichroic glass , substrate (aquarium) , infrared , diffraction , optical materials , crystallization , optoelectronics , optics , nanotechnology , chemical engineering , medicine , oceanography , physics , alternative medicine , engineering , pathology , geology
Highly oriented polysilylene layers have potential applications in electrophotography, nonlinear optics, display fabrication, and microlithography. The preparation of such layers by crystallization on a highly oriented PTFE substrate is reported, and their assessment by optical birefringence, electron diffraction and dichroic infrared experiments described. Why this orientation technique works is not yet clear, especially as it can be applied to poly(di‐ n ‐alkylsilylen)s with different crystal structures. Several possible underlying mechanisms are discussed.