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Modeling the elementary steps of low‐pressure diamond deposition
Author(s) -
Biener Jürgen,
Schubert Uwe. A.,
Schenk Angelika,
Winter Bernd,
Lutterloh Carsten,
Küppers Jürgen
Publication year - 1993
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19930050909
Subject(s) - diamond , dehydrogenation , graphite , materials science , deposition (geology) , monolayer , chemical engineering , hydrocarbon , hydrogen , erosion , chemical vapor deposition , phase (matter) , nanotechnology , chemical physics , metallurgy , organic chemistry , chemistry , catalysis , geology , paleontology , sediment , engineering
Low‐pressure diamond deposition from hydrocarbon/hydrogen gas‐phase mixtures was discovered over 20 years ago, but the exact deposition mechanism remained unknown. Work reported here confirms preferential graphite erosion to be the rate‐controlling step, as had been assumed by some researchers earlier, and identifies reaction pathways by which the graphitic constituents of the deposit are preferentially removed. Model systems of C:H a few monolayers thick were used to show that dehydrogenation, erosion, and hydrogenation all play a part.