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DNA technology in chip construction
Author(s) -
Di Mauro Ernesto,
Hollenberg Cornelis P.
Publication year - 1993
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19930050512
Subject(s) - photolithography , photomask , materials science , lithography , computational lithography , limiting , resist , electron beam lithography , nanotechnology , chip , silicon , next generation lithography , optoelectronics , x ray lithography , electrical engineering , engineering , mechanical engineering , layer (electronics)
The use of photolithography of produce 3 nm features sounds like a pipe dream. But is it? The circuit size achievable with X‐ray lithography cannot be pushed below 0.25 μm due to limiting lens technology. Now it has been shown that the genetic material DNA can be used to form micro‐photomasks with features 100 times smaller than those on current silicon chips. The construction of nucleic and networks, their conversion into electron‐conducting networks, and their use in photolithography are described.