Chemical vapor deposition of silicon carbide powders using pulsed CO 2  Lasers | Zendy

Scholz Malte | Zendy; Fuß Werner | Zendy; Kompa KarlLudwig | Zendy

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Chemical vapor deposition of silicon carbide powders using pulsed CO 2 Lasers

Author(s) -

Scholz Malte,

Fuß Werner,

Kompa KarlLudwig

Publication year - 1993

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.19930050106

Subject(s) - materials science , tetramethylsilane , silicon carbide , ceramic , chemical vapor deposition , laser , crystallite , polymer , pyrolysis , composite material , chemical engineering , nanotechnology , metallurgy , optics , organic chemistry , chemistry , physics , engineering

A carbosilane polymer which survives temperatures up to 2000°C is reported. It deposits on the surface of SiC particulates which form during the laser pyrolysis of tetramethylsilane, and has possible applications as a sintering aid for SiC or in reducing brittleness in ceramic composites. Powders consisting of 8–10 nm SiC crystallites embedded in the carbosilane polymer are produced in the plasma formed by a focused CO 2 laser.

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