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Chaos at Interface Brings Order into Oxide/Silicon Structure
Author(s) -
Averyanov Dmitry V.,
Sokolov Ivan S.,
Karateev Igor A.,
Taldenkov Alexander N.,
Kondratev Oleg A.,
Parfenov Oleg E.,
Tokmachev Andrey M.,
Storchak Vyacheslav G.
Publication year - 2021
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.202104925
Subject(s) - materials science , silicon , spintronics , template , epitaxy , interface (matter) , nanotechnology , semiconductor , oxide , phase (matter) , optoelectronics , engineering physics , condensed matter physics , layer (electronics) , ferromagnetism , wetting , chemistry , physics , organic chemistry , sessile drop technique , composite material , engineering , metallurgy
Abstract Integration of oxides with silicon fuses advanced functional properties with a mature technological platform. In particular, direct EuO/Si contact holds high promise for spintronics but requires single‐crystalline epitaxial films with atomically sharp interfaces. The standard approach employing regular 2D superstructures of metal atoms on the Si surface fails to meet the challenge. Here, an alternative route is designed and shown to solve the problem. This route avoids regular templates; the chaotic 2D distribution of metal atoms on the Si surface prevents stabilization of unwanted crystal orientations. Thus, the disordered submonolayer phase at the interface promotes order in oxide/Si coupling, as witnessed by a combination of diffraction techniques and high‐resolution electron microscopy. The results not only mark tangible progress in manufacturing EuO/Si contacts but also provide a general framework for monolithic integration of functional oxides with semiconductor substrates.