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Morphology Inversion of a Non‐Fullerene Acceptor Via Adhesion Controlled Decal‐Coating for Efficient Conversion and Detection in Organic Electronics
Author(s) -
Kim Min Soo,
Jang Woongsik,
Nguyen ThucQuyen,
Wang Dong Hwan
Publication year - 2021
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.202103705
Subject(s) - materials science , photoactive layer , coating , spin coating , acceptor , thin film , chemical engineering , energy conversion efficiency , organic solar cell , organic electronics , polymer , composite material , nanotechnology , optoelectronics , engineering , physics , condensed matter physics , transistor , quantum mechanics , voltage
In this study, a promising film formation technique is highlighted, named mold‐assisted decal‐coating, as a thin film transfer printing process using the polyurethane acrylate‐based stamping mold. By optimizing the surface energy of the mold with wetting coefficient theory, the mold‐assisted decal‐coating process is successfully demonstrated by transferring the photoactive layer composed of the polymer donor, poly[4,8‐bis(5‐(2‐ethylhexyl)thiophen‐2‐yl)benzo[1,2‐ b ;4,5‐ b ′]dithiophene‐2,6‐diyl‐alt‐(4‐(2‐ethylhexyl)‐3‐fluorothieno[3,4‐ b ]thiophene‐)‐2‐carboxylate‐2‐6‐diyl)] and a narrow bandgap non‐fullerene acceptor (NFA), 2,2′‐[[4,4,9,9‐tetrakis(4‐hexylphenyl)‐4,9‐dihydro‐s‐indaceno[1,2‐ b :5,6‐ b ′]dithiophene‐2,7‐diyl]bis[[4‐[(2‐ethylhexyl)oxy]‐5,2‐thiophenediyl]methylidyne(5,6‐difluoro‐3‐oxo‐1H‐indene‐2,1(3H)‐diylidene)]]bis[propanedinitrile]. This process induces a well‐ordered morphology of photoactive material, prevents damage to the underlying layer by suppressing the solvent penetration. Both photovoltaic cells and photodetectors prepared by the decal‐coated photoactive layers containing fluorinated NFAs showed higher performance (power conversion efficiency = 10.69% and specific detectivity = 1.27 × 10 12 A cm Hz 1/2 W −1 , respectively) than those of cells prepared by the spin‐coating method owing to morphology inversion and smoother interface that led to suppressed internal resistance and enhanced charge flow in normal structure. Thus, the reproducible decal‐coating process using a customized elastomeric mediator is an important thin film coating technique for efficient next‐generation organic optoelectronic materials.