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Green Lithography for Delicate Materials
Author(s) -
Grebenko Artem,
Bubis Anton,
Motovilov Konstantin,
Dremov Viacheslav,
Korostylev Evgeny,
Kindiak Ivan,
Fedorov Fedor S.,
Luchkin Sergey,
Zhuikova Yuliya,
Trofimenko Aleksandr,
Filkov Gleb,
Sviridov Georgiy,
Ivanov Andrey,
Dull Jordan T.,
Mozhchil Rais,
Ionov Andrey,
Varlamov Valery,
Rand Barry P.,
Podzorov Vitaly,
Nasibulin Albert G.
Publication year - 2021
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.202101533
Subject(s) - lithography , nanotechnology , materials science , resist , organic semiconductor , semiconductor , fabrication , optoelectronics , layer (electronics) , medicine , alternative medicine , pathology
A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low‐dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top‐down and bottom‐up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub‐micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water‐based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.