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Photoresist Films: Freestanding Photoresist Film: A Versatile Template for Three‐Dimensional Micro‐ and Nanofabrication (Adv. Funct. Mater. 42/2020)
Author(s) -
Liu Yuyang,
Du Ke,
Wathuthanthri Ishan,
Xu Wei,
Choi ChangHwan
Publication year - 2020
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.202070277
Subject(s) - photoresist , materials science , nanolithography , nanotechnology , lithography , stencil , substrate (aquarium) , layer (electronics) , micropatterning , fabrication , optoelectronics , computer science , medicine , oceanography , alternative medicine , computational science , pathology , geology
In article number 2004129, Chang‐Hwan Choi and co‐workers introduce a novel sacrificial‐layer‐free lifting‐off process that can release a pre‐patterned photoresist film from a supporting substrate, leveraging the formation of bubbles at the interface during the decomposition of hydrogen peroxide solution. The flexible and durable freestanding film with lithographically defined features can serve as a versatile platform such as template, stencil, and scaffold for rapid, scalable, and robust 3D micro‐ and nanofabrication.