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Alumina‐Protected, Durable and Photostable Zinc Sulfide Particles from Scalable Atomic Layer Deposition
Author(s) -
Lange Thomas,
Reichenberger Sven,
Rohe Markus,
Bartsch Mathias,
Kampermann Laura,
Klein Julian,
Strunk Jennifer,
Bacher Gerd,
Schlögl Robert,
Barcikowski Stephan
Publication year - 2021
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.202009323
Subject(s) - zinc sulfide , materials science , atomic layer deposition , amorphous solid , layer (electronics) , chemical engineering , calcination , zinc , deposition (geology) , sulfide , irradiation , inert , nanotechnology , metallurgy , catalysis , crystallography , organic chemistry , chemistry , paleontology , physics , sediment , nuclear physics , engineering , biology
Zinc sulfide has unique and easily modifiable photophysical properties and is a promising candidate for photocatalysis and optoelectronic devices. However, ZnS suffers from corrosive decomposition during excitation processes like UV irradiation, which drastically limits its field of potential applications. For the first time, complete photostabilization of individual ZnS particles by a dense, durable, and only 3‐nm‐thick Al 2 O 3 layer, produced by rotary atomic layer deposition (ALD) is reported. In contrast to bare ZnS, the coated particles do not suffer from photocorrosive degradation even under long‐term or high power UV irradiation. The presence of a protection layer covering the entire ZnS surface is additionally confirmed by microscopic and spectroscopic investigations of particle cross‐sections. Further, complete inhibition of the reaction between Ag + ions added as the analyte and the ZnS surface is observed. Durability tests of the as‐prepared Al 2 O 3 layer upon prolonged exposure to water reveal a significant decrease in the protection capability of the layer, which is ascribed to the hydrolysis of the amorphous Al 2 O 3 . A calcination step at 1000 °C after the ALD treatment, which leads to crystallization of the amorphous Al 2 O 3 layer, successfully suppresses this hydrolysis and produces an insulating, dense, and inert protection layer.