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Engineering the Photocatalytic Behaviors of g/C 3 N 4 ‐Based Metal‐Free Materials for Degradation of a Representative Antibiotic
Author(s) -
Deng Yanchun,
Liu Jun,
Huang Yanbin,
Ma Mengmeng,
Liu Kong,
Dou Xiaomin,
Wang Zhijie,
Qu Shengchun,
Wang Zhanguo
Publication year - 2020
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.202002353
Subject(s) - photocatalysis , materials science , degradation (telecommunications) , catalysis , graphitic carbon nitride , carbon nitride , metal , decomposition , chemical engineering , nanotechnology , organic chemistry , chemistry , metallurgy , engineering , telecommunications , computer science
Abstract Graphitic carbon nitride (g/C 3 N 4 ) is of promise as a highly efficient metal‐free photocatalyst, yet engineering the photocatalytic behaviours for efficiently and selectively degrading complicated molecules is still challenging. Herein, the photocatalytic behaviors of g/C 3 N 4 are modified by tuning the energy band, optimizing the charge extraction, and decorating the cocatalyst. The combination shows a synergistic effect for boosting the photocatalytic degradation of a representative antibiotic, lincomycin, both in the degradation rate and the degree of decomposition. In comparison with the intrinsic g/C 3 N 4 , the structurally optimized photocatalyst shows a tenfold enhancement in degradation rate. Interestingly, various methods and experiments demonstrate the specific catalytic mechanisms for the multiple systems of g/C 3 N 4 ‐based photocatalysts. In the degradation, the active species, including ·O 2 − , ·OH, and h + , have different contributions in the different photocatalysts. The intermediate, H 2 O 2 , plays an important role in the photocatalytic process, and the detailed functions and originations are clarified for the first time.