Premium
A Subtractive Photoresist Platform for Micro‐ and Macroscopic 3D Printed Structures
Author(s) -
Zieger Markus M.,
Müller Patrick,
Blasco Eva,
Petit Charlotte,
Hahn Vincent,
Michalek Lukas,
Mutlu Hatice,
Wegener Martin,
BarnerKowollik Christopher
Publication year - 2018
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201801405
Subject(s) - photoresist , microscale chemistry , subtractive color , resist , materials science , stereolithography , fabrication , 3d printing , nanotechnology , undercut , lithography , nanoindentation , optoelectronics , optics , composite material , medicine , mathematics education , mathematics , physics , alternative medicine , layer (electronics) , pathology
Abstract The selective removal of structural elements plays a decisive role in 3D printing applications enabling complex geometries. To date, the fabrication of complex structures on the microscale is severely limited by multistep processes. Herein, a subtractive photoresist platform technology that is transferable from microscopic 3D printing via direct laser writing to macroscopic structures via stereolithography is reported. All resist components are readily accessible and exchangeable, offering fast adaptation of the resist's property profile. The micro‐ and macroprinted structures can be removed in a facile fashion, without affecting objects based on standard photoresists. The cleavage is analyzed by time‐lapse optical microscopy as well as via in‐depth spectroscopic assessment. The mechanical properties of the printed materials are investigated by nanoindentation. Critically, the power of the subtractive resist platform is demonstrated by constructing complex 3D objects with flying features on the microscale.