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Photopatterning Freestanding Chiral Nematic Mesoporous Organosilica Films
Author(s) -
Terpstra Andrea S.,
Hamad Wadood Y.,
MacLachlan Mark J.
Publication year - 2017
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201703346
Subject(s) - spiropyran , photochromism , materials science , mesoporous material , mesoporous organosilica , chemical engineering , photochemistry , mesoporous silica , nanotechnology , organic chemistry , chemistry , engineering , catalysis
Abstract Chiral nematic mesoporous organosilica (CNMO) films are functionalized with a mixture of hydrophobic silanes and spiropyran compounds to create freestanding photochromic films that can be used for reversible photopatterning. The mesoporosity and interconnected pore structure of the films imparted by the cellulose nanocrystal template enables a large cross‐section of the material to be functionalized. Thus, the materials show intense absorption spectra from the tethered spiropyran and rapid color changes when the porous films are irradiated with UV or white light. The spiropyran‐bound CNMO films behave as reversible sensors where metal binding to the spiropyran results in visible color changes detectable by the naked eye. These metals can be removed in the presence of ethanol and white light, regenerating the metal‐free film. The proof‐of‐concept demonstrated in this paper may help to develop new photochromic displays, security features, and patterns.