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Photolithography: Rational and Facile Construction of 3D Annular Nanostructures with Tunable Layers by Exploiting the Diffraction and Interference of Light (Adv. Funct. Mater. 29/2016)
Author(s) -
Choe JongHo,
Park QHan,
You EunAh
Publication year - 2016
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201670183
Subject(s) - materials science , photolithography , nanostructure , diffraction , interference (communication) , nanotechnology , optoelectronics , optics , computer science , telecommunications , channel (broadcasting) , physics
On page 5203, E.‐A. You and co‐workers report a novel approach to creating arrays of 3D annular nanostructures with tunable layers by exploiting the diffraction and interference of light. In addition to the generation and functional application of arrays of single‐, double‐, and triple‐layered ring structures, the formation mechanism via 3D modelling provides a design rule for constructing controllable 3D nanostructures for versatile applications.