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Self‐Assembly: Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes (Adv. Funct. Mater. 45/2014)
Author(s) -
He Chunlin,
Stoykovich Mark P.
Publication year - 2014
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201470295
Subject(s) - materials science , copolymer , bilayer , nanostructure , thin film , nanotechnology , photoresist , block (permutation group theory) , template , layer (electronics) , polymer , membrane , composite material , biology , genetics , geometry , mathematics
Beyond Manhattan type profiles in block copolymer nanostructures. On page 7078 C. He and M. P. Stoykovich present an approach, analogous to that in bilayer photoresist films, to achieve tunable interface shapes and sidewall profiles in block copolymers self‐assembled in thin films. Such interfacial control provides the unique opportunity to design block copolymer nano‐structures specially tuned for pattern transfer into functional materials. Cover design by Chunlin He and Kathryn Morrissey.