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Quartz Films: Water‐Induced Phase Separation Forming Macrostructured Epitaxial Quartz Films on Silicon (Adv. Funct. Mater. 35/2014)
Author(s) -
Drisko Glenna L.,
CarreteroGenevrier Adrian,
Gich Martí,
Gàzquez Jaume,
Ferrah Djawhar,
Grosso David,
Boissière Cédric,
RodriguezCarvajal Juan,
Sanchez Clément
Publication year - 2014
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201470233
Subject(s) - materials science , epitaxy , quartz , silicon , fabrication , piezoelectricity , optoelectronics , nanotechnology , chemical engineering , composite material , layer (electronics) , medicine , alternative medicine , pathology , engineering
The combination of sol‐gel chemistry and epitaxial growth provides direct access to the integration of piezoelectric macroporous quartz, epitaxially grown on (100)‐silicon substrates. A. Carretero‐Genevrier and co‐workers demonstrate on page 5494 that the interplay between temperature, humidity, catalyst content, and epitaxial growth plays a key role for the bottom‐up fabrication of macroporous quartz on silicon substrates.