Premium
High Performance Mg 2 (Si,Sn) Solid Solutions: a Point Defect Chemistry Approach to Enhancing Thermoelectric Properties
Author(s) -
Jiang Guangyu,
He Jian,
Zhu Tiejun,
Fu Chenguang,
Liu Xiaohua,
Hu Lipeng,
Zhao Xinbing
Publication year - 2014
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201400123
Subject(s) - materials science , doping , dopant , thermoelectric effect , crystallographic defect , thermoelectric materials , solid solution , figure of merit , thermal conductivity , analytical chemistry (journal) , nanotechnology , crystallography , metallurgy , optoelectronics , thermodynamics , chemistry , composite material , chromatography , physics
A point defect chemistry approach to improving thermoelectric (TE) properties is introduced, and its effectiveness in the emerging mid‐temperature TE material Mg 2 (Si,Sn) is demonstrated. The TE properties of Mg 2 (Si,Sn) are enhanced via the synergistical implementation of three types of point defects, that is, Sb dopants, Mg vacancies, and Mg interstitials in Mg 2 Si 0.4 Sn 0.6‐ x Sb x with high Sb content ( x > 0.1), and it is found that i) Sb doping at low ratios tunes the carrier concentration while it facilitates the formation of Mg vacancies at high doping ratios ( x > 0.1). Mg vacancies act as acceptors and phonon scatters; ii) the concentration of Mg vacancies is effectively controlled by the Sb doping ratio; iii) excess Mg facilitates the formation of Mg interstitials that also tunes the carrier concentration; vi) at the optimal Sb‐doping ratio near x ≈ 0.10 the lattice thermal conductivity is significantly reduced, and a state‐of‐the‐art figure of merit ZT > 1.1 is attained at 750 K in 2 at% Zn doped Mg 2 Si 0.4 Sn 0.5 Sb 0.1 specimen. These results demonstrate the significance of point defects in thermoelectrics, and the promise of point defect chemistry as a new approach in optimizing TE properties.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom