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Synchrotron X‐Ray Scanning Tunneling Microscopy: Synchrotron X‐Ray Scanning Tunneling Microscopy: Fingerprinting Near to Far Field Transitions on Cu(111) Induced by Synchrotron Radiation (Adv. Funct. Mater. 20/2013)
Author(s) -
Rose Volker,
Wang Kangkang,
Chien TeYu,
Hiller Jon,
Rosenmann Daniel,
Freeland John W.,
Preissner Curt,
Hla SawWai
Publication year - 2013
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201370099
Subject(s) - synchrotron radiation , scanning tunneling microscope , synchrotron , materials science , microscopy , x ray , photoemission electron microscopy , spin polarized scanning tunneling microscopy , optics , scanning electron microscope , physics , electron microscope , nanotechnology , scanning tunneling spectroscopy
On page 2646 Volker Rose and co‐workers present a smart tip for synchrotron X‐ray scanning tunneling microscopy that is entirely coated by an insulating oxide, except at the tip apex. The tip is only sensitive to X‐ray‐excited tunnel currents and not to photoejected electrons caused by classical photo emission, which would degrade the spatial resolution. The bright light in the image, coming in from the right, that hits the tip apex schematically represents the synchrotron beam during an experiment.