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3D Patterning: 3D Free‐Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching (Adv. Funct. Mater. 19/2012)
Author(s) -
Fischer Andreas C.,
Belova Lyubov M.,
Rikers Yuri G. M.,
Malm B. Gunnar,
Radamson Henry H.,
Kolahdouz Mohammadreza,
Gylfason Kristinn B.,
Stemme Göran,
Niklaus Frank
Publication year - 2012
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201290115
Subject(s) - materials science , silicon , etching (microfabrication) , nanotechnology , fabrication , deposition (geology) , ion beam , focused ion beam , reactive ion etching , nanostructure , optoelectronics , ion implantation , ion , chemistry , layer (electronics) , medicine , paleontology , alternative medicine , organic chemistry , pathology , sediment , biology
On page 4004 , Frank Niklaus and co‐workers report on the fabrication of 3D nanostructures by alternating steps of silicon deposition and local ion implantation by focused ion beam (FIB) writing. The defined 3D nanostructures are formed in a final step by selective silicon etching.