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Photochemical Generation of Light Responsive Surfaces
Author(s) -
Blasco Eva,
Piñol Milagros,
Oriol Luis,
Schmidt Bernhard V. K. J.,
Welle Alexander,
Trouillet Vanessa,
Bruns Michael,
BarnerKowollik Christopher
Publication year - 2013
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201203602
Subject(s) - azobenzene , materials science , photochemistry , surface modification , tetrazole , x ray photoelectron spectroscopy , maleimide , cycloaddition , isomerization , nitrile , polymer chemistry , chemical engineering , organic chemistry , polymer , chemistry , composite material , catalysis , engineering
The preparation of patterned photoswitchable surfaces by employing the nitrile imine‐mediated tetrazole ene cycloaddition (NITEC) photoinduced reaction in the presence of dipolarophiles based on photoresponsive azobenzene moieties is reported. The dipolarophile used is a maleimide carrying either an azobenzene unit or a first generation dendron containing two azobenzene units. X‐ray photoelectron spectroscopy (XPS) is employed to analyze the functionalized silicon wafers, while time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) evidences the spatial control of the functionalization of the surface achieved by using a micropatterned shadow mask. Water contact angle measurements and optical inspection observing the behavior of a water droplet demonstrate the photoinduced change on wettability of the structured functionalized surfaces due to the reversible trans ‐to‐ cis isomerization of the azobenzene moities.