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Continuous Control of Charge Transport in Bi‐Deficient BiFeO 3 Films Through Local Ferroelectric Switching
Author(s) -
Kim Tae Heon,
Jeon Byung Chul,
Min Taeyoon,
Yang Sang Mo,
Lee Daesu,
Kim Yong Su,
Baek SeungHyub,
Saenrang Wittawat,
Eom ChangBeom,
Song Tae Kwon,
Yoon JongGul,
Noh Tae Won
Publication year - 2012
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201201490
Subject(s) - materials science , ferroelectricity , piezoresponse force microscopy , hysteresis , polarization (electrochemistry) , optoelectronics , capacitor , electric field , voltage , condensed matter physics , nanotechnology , electrical engineering , physics , dielectric , chemistry , quantum mechanics , engineering
It is demonstrated that electric transport in Bi‐deficient Bi 1‐ δ FeO 3 ferroelectric thin films, which act as a p‐type semiconductor, can be continuously and reversibly controlled by manipulating ferroelectric domains. Ferroelectric domain configuration is modified by applying a weak voltage stress to Pt/Bi 1‐ δ FeO 3 /SrRuO 3 thin‐film capacitors. This results in diode behavior in macroscopic charge‐transport properties as well as shrinkage of polarization‐voltage hysteresis loops. The forward current density depends on the voltage stress time controlling the domain configuration in the Bi 1‐ δ FeO 3 film. Piezoresponse force microscopy shows that the density of head‐to‐head/tail‐to‐tail unpenetrating local domains created by the voltage stress is directly related to the continuous modification of the charge transport and the diode effect. The control of charge transport is discussed in conjunction with polarization‐dependent interfacial barriers and charge trapping at the non‐neutral domain walls of unpenetrating tail‐to‐tail domains. Because domain walls in Bi 1‐ δ FeO 3 act as local conducting paths for charge transport, the domain‐wall‐mediated charge transport can be extended to ferroelectric resistive nonvolatile memories and nanochannel field‐effect transistors with high performances conceptually.
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