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NANOARCHITECTURES: High‐Resolution Patterning of Various Large‐Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub‐30‐nm Line, Ellipsoid, Rectangle, and Circle Arrays (Adv. Funct. Mater. 10/2011)
Author(s) -
Lee Seungwoo,
Kang Hong Suk,
Park JungKi
Publication year - 2011
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201190034
Subject(s) - materials science , lithography , photolithography , rectangle , line (geometry) , nanotechnology , optics , optoelectronics , geometry , mathematics , physics
A principal challenge in nanopatterning is to beat the resolution limit of established methods. On page 1770 , Seungwoo Lee, Hong Suk Kang, and Jung‐Ki Park present the directional photofluidization of azopolymers, which allows the generation of large‐area, highly ordered nanoarchitectures with precisely controlled structural features. Additionally, this approach can offer unprecedented flexibility in control of the final feature size, and, simultaneously, its fluidic behavior under light irradiation signifi cantly reduces the line‐edge roughness