Premium
Tin Dioxide Sensing Layer Grown on Tubular Nanostructures by a Non‐Aqueous Atomic Layer Deposition Process
Author(s) -
Marichy Catherine,
Donato Nicola,
Willinger MarcGeorg,
Latino Mariangela,
Karpinsky Dmitry,
Yu SeungHo,
Neri Giovanni,
Pinicola
Publication year - 2011
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.201001572
Subject(s) - tin dioxide , materials science , atomic layer deposition , conformal coating , nanocrystalline material , layer (electronics) , tin , coating , nanotechnology , chemical engineering , thin film , deposition (geology) , atomic layer epitaxy , titanium dioxide , nanostructure , heterojunction , aqueous solution , composite material , optoelectronics , metallurgy , organic chemistry , paleontology , sediment , engineering , biology , chemistry
Abstract A new atomic layer deposition (ALD) process for nanocrystalline tin dioxide films is developed and applied for the coating of nanostructured materials. This approach, which is adapted from non‐hydrolytic sol‐gel chemistry, permits the deposition of SnO 2 at temperatures as low as 75 °C. It allows the coating of the inner and outer surface of multiwalled carbon nanotubes with a highly conformal film of controllable thickness. The ALD‐coated tubes are investigated as active components in gas‐sensor devices. Due to the formation of a p‐n heterojunction between the highly conductive support and the SnO 2 thin film an enhancement of the gas sensing response is observed.