Premium
Polystyrene Arrays: Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography (Adv. Funct. Mater. 20/2009)
Author(s) -
Plettl Alfred,
Enderle Fabian,
Saitner Marc,
Manzke Achim,
Pfahler Christian,
Wiedemann Stefan,
Ziemann Paul
Publication year - 2009
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200990091
Subject(s) - materials science , polystyrene , reactive ion etching , etching (microfabrication) , colloid , plasma etching , nanosphere lithography , nanotechnology , monolayer , fabrication , lithography , isotropy , colloidal crystal , chemical engineering , composite material , layer (electronics) , optoelectronics , polymer , optics , medicine , alternative medicine , physics , pathology , engineering
Hexagonally ordered arrays of non‐close‐packed spherical polystyrene (PS) particles are prepared by A. Plettl et al. on page 3279 , and exhibit precisely controlled diameters and interparticle distances. An isotropic low‐temperature plasma‐etching process is applied to extended monolayers of PS colloids deposited onto hydrophilic silicon. These non‐close‐packed PS arrays are used as masks for the fabrication of arrays of cylindrical nanopores by reactive ion etching.