Photolithography: Fabrication of Flexible Binary Amplitude Masks for Patterning on Highly Curved Surfaces (Adv. Funct. Mater. 20/2009) | Zendy

Bowen Audrey M. | Zendy; Nuzzo Ralph G. | Zendy

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Photolithography: Fabrication of Flexible Binary Amplitude Masks for Patterning on Highly Curved Surfaces (Adv. Funct. Mater. 20/2009)

Author(s) -

Bowen Audrey M.,

Nuzzo Ralph G.

Publication year - 2009

Publication title -

advanced functional materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 6.069

H-Index - 322

eISSN - 1616-3028

pISSN - 1616-301X

DOI - 10.1002/adfm.200990090

Subject(s) - photomask , photolithography , materials science , fabrication , lithography , planar , optics , lens (geology) , amplitude , radius , optoelectronics , nanotechnology , resist , layer (electronics) , computer science , computer graphics (images) , medicine , alternative medicine , physics , pathology , computer security

The front cover image shows a photolithographically defined gold pattern on the curved surface of a cylindrical glass lens (12.5‐mm radius) using a photomask made by using the soft lithography protocols reported by Bowen and Nuzzo on page 3243 . The described methods provide highly flexible photomasks, of both positive and negative image contrasts, that serve as amplitude masks for large area photolithographic patterning on a variety of curved (and planar) surfaces.

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