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Photolithography: Fabrication of Flexible Binary Amplitude Masks for Patterning on Highly Curved Surfaces (Adv. Funct. Mater. 20/2009)
Author(s) -
Bowen Audrey M.,
Nuzzo Ralph G.
Publication year - 2009
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200990090
Subject(s) - photomask , photolithography , materials science , fabrication , lithography , planar , optics , lens (geology) , amplitude , radius , optoelectronics , nanotechnology , resist , layer (electronics) , computer science , computer graphics (images) , medicine , alternative medicine , physics , pathology , computer security
The front cover image shows a photolithographically defined gold pattern on the curved surface of a cylindrical glass lens (12.5‐mm radius) using a photomask made by using the soft lithography protocols reported by Bowen and Nuzzo on page 3243 . The described methods provide highly flexible photomasks, of both positive and negative image contrasts, that serve as amplitude masks for large area photolithographic patterning on a variety of curved (and planar) surfaces.