Premium
Patterned Synthesis of Pd 4 S: Chemically Robust Electrodes and Conducting Etch Masks
Author(s) -
Radha Boya,
Kulkarni Giridhar U.
Publication year - 2010
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200901766
Subject(s) - materials science , palladium , oxidizing agent , lithography , electrode , electron beam lithography , nanotechnology , thermal decomposition , characterization (materials science) , chemical engineering , diffraction , scanning electron microscope , optoelectronics , resist , catalysis , optics , organic chemistry , composite material , chemistry , physics , layer (electronics) , engineering
A simple, one‐step process to synthesize Pd 4 S films is reported here along with their characterization using X‐ray diffraction, electron microscopy, and electrical measurements. The synthesis involves thermolysis of a single‐source precursor, namely palladium alkanethiolate, in H 2 atmosphere at 250 °C for 3 h. The films are highly conducting and resistant to strong acidic, alkali, and oxidizing environments. The precursor allows patterning of the Pd 4 S films by electron beam lithography and micromolding, an attribute that has been employed in making chemically resistant electrodes and etch masks. The conversion of palladium thiolate to other sulfide phases is also achieved.