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Detachment Lithography of Photosensitive Polymers: A Route to Fabricating Three‐Dimensional Structures
Author(s) -
Yeom Junghoon,
Shan Mark A.
Publication year - 2010
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200900686
Subject(s) - photolithography , materials science , polydimethylsiloxane , pdms stamp , lithography , photomask , nanotechnology , resist , soft lithography , microelectromechanical systems , elastomer , polymer , microcontact printing , transfer printing , microfluidics , etching (microfabrication) , planar , photoresist , optoelectronics , fabrication , composite material , medicine , alternative medicine , computer graphics (images) , pathology , layer (electronics) , computer science
A technique to create arrays of micrometer‐sized patterns of photosensitive polymers on the surface of elastomeric stamps and to transfer these patterns to planar and nonplanar substrates is presented. The photosensitive polymers are initially patterned through detachment lithography (DL), which utilizes the difference in adhesion forces to induce the mechanical failure in the film along the edges of the protruded parts of the mold. A polydimethylsiloxane (PDMS) stamp with a kinetically and thermally adjustable adhesion and conformal contact can transfer the detached patterns to etched or curved substrates, as well as planar ones. These printed patterns remain photochemically active for further modification via photolithography, and/or can serve as resists for subsequent etching or deposition, such that photolithography can be used on highly nonconformal and nonplanar surfaces. Various 3D structures fabricated using the process have potential applications in MEMS (micro‐electromechanical systems) sensors/actuators, optical devices, and microfluidics.