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Patterning Semiconductor Nanocrystals in Polymer Films
Author(s) -
Paquet C.,
Kumacheva E.
Publication year - 2007
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200700409
Subject(s) - materials science , polymerization , polymer , nanocrystal , monomer , lithography , semiconductor , nanotechnology , chemical engineering , phase (matter) , optoelectronics , composite material , organic chemistry , chemistry , engineering
This paper reports a method of patterning semiconductor nanocrystals (NCs) in a polymer film. By combining lithographic concept with polymerization‐induced phase separation in a NC‐monomer mixture, we produced topographic and lateral compositional patterns in NC‐polymer films. The quality of the patterns was controlled by the competition between the rate of polymerization‐induced phase separation and the change in viscosity of the polymerizing mixture.