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Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning
Author(s) -
Pfeiffer F.,
Felix N. M.,
Neuber C.,
Ober C. K.,
Schmidt H.W.
Publication year - 2007
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200600717
Subject(s) - photoresist , materials science , deposition (geology) , chemical engineering , monomer , resist , solvent , aqueous solution , chemical vapor deposition , nanotechnology , polymer , composite material , organic chemistry , layer (electronics) , chemistry , sediment , engineering , biology , paleontology
A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent‐free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post exposure bake step, and developed in aqueous base to produce sub‐micron patterns. Combinatorial techniques were used to aid optimization of the photoresist by systematic variations in composition and exposure dose. Development factors such as concentration and time were also optimized.