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Chemical Amplification of a Triphenylene Molecular Electron Beam Resist
Author(s) -
Zaid H. M.,
Robinson A. P. G.,
Palmer R. E.,
Manickam M.,
Preece J. A.
Publication year - 2007
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200600653
Subject(s) - triphenylene , resist , materials science , cationic polymerization , electron beam lithography , photochemistry , nanotechnology , polymer chemistry , optoelectronics , chemistry , layer (electronics) , liquid crystal
Abstract Molecular resists, such as triphenylene derivatives, are small carbon rich molecules, and thus give the potential for higher lithographic resolution and etch durability, and lower line width roughness than traditional polymeric compounds. Their main limitation to date has been poor sensitivity. A new triphenylene derivative molecular resist, with pendant epoxy groups to aid chemically amplified crosslinking, was synthesized and characterized. The sensitivity of the negative tone, pure triphenylene derivative when exposed to an electron beam with energy 20 keV was ∼ 6 × 10 –4 C cm –2 , which increased substantially to ∼ 1.5 × 10 –5 C cm –2 after chemical amplification (CA) using a cationic photoinitiator. This was further improved, by the addition of a second triphenylene derivative, to ∼ 7 × 10 –6 C cm –2 . The chemically amplified resist demonstrated a high etch durability comparable with the novolac resist SAL 601. Patterns with a minimum feature size of ∼ 40 nm were realized in the resist with a 30 keV electron beam.