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Sacrificial‐Layer Atomic Layer Deposition for Fabrication of Non‐Close‐Packed Inverse‐Opal Photonic Crystals
Author(s) -
Graugnard E.,
King J. S.,
Gaillot D. P.,
Summers C. J.
Publication year - 2006
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200500841
Subject(s) - materials science , fabrication , atomic layer deposition , photonic crystal , photonics , layer (electronics) , inverse , dielectric , refractive index , optoelectronics , deposition (geology) , nanometre , nanotechnology , optics , composite material , medicine , paleontology , alternative medicine , geometry , mathematics , physics , pathology , sediment , biology
A method is presented for predicting and precisely controlling the structure of photonic crystals fabricated using sacrificial‐layer atomic layer deposition. This technique provides a reliable method for fabrication of high‐quality non‐close‐packed inverse shell opals with large static tunability and precise structural control. By using a sacrificial layer during opal infiltration, the inverse‐opal pore size can be increased with sub‐nanometer resolution and without distorting the lattice to allow for a high degree of dielectric backfilling and increased optical tunability. For a 10 % sacrificial layer, static tunability of 80 % is predicted for the inverse opal. To illustrate this technique, SiO 2 opal templates were infiltrated using atomic layer deposition of ZnS, Al 2 O 3 , and TiO 2 . Experimentally, a static tunability of over 600 nm, or 58 %, was achieved and is well described by both a geometrical model and a numerical‐simulation algorithm. When extended to materials of higher refractive index, this method will allow the facile fabrication of 3D photonic crystals with optimized photonic bandgaps.