Premium
Conductive SU8 Photoresist for Microfabrication
Author(s) -
Jiguet S.,
Bertsch A.,
Hofmann H.,
Renaud P.
Publication year - 2005
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200400575
Subject(s) - photoresist , materials science , microfabrication , electrical conductor , nanotechnology , silver nanoparticle , electrode , composite number , composite material , optoelectronics , nanoparticle , fabrication , medicine , alternative medicine , layer (electronics) , pathology , chemistry
A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non‐conductive, negative‐tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.‐%.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom