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Patterned Self‐Assembled Monolayers on Silicon Oxide Prepared by Nanoimprint Lithography and Their Applications in Nanofabrication
Author(s) -
Maury P.,
Péter M.,
Mahalingam V.,
Reinhoudt D. N.,
Huskens J.
Publication year - 2005
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200400284
Subject(s) - materials science , nanoimprint lithography , nanolithography , nanotechnology , monolayer , silicon , silane , self assembled monolayer , micrometer , lithography , self assembly , substrate (aquarium) , polymer , fabrication , silicon oxide , optoelectronics , layer (electronics) , composite material , medicine , alternative medicine , silicon nitride , pathology , oceanography , physics , geology , optics
Nanoimprint lithography (NIL) is used as a tool to pattern self‐assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate‐functionalized particles is achieved. Further applications of the NIL‐patterned substrates include template‐directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.