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Fabrication and Characterization of Stable Ultrathin Film Micropatterns Containing CdS Nanoparticles
Author(s) -
Lu C.H.,
Wu N.Z.,
Wei F.,
Zhao X.S.,
Jiao X.M.,
Xu J.,
Luo C.Q.,
Cao W.X.
Publication year - 2003
Publication title -
advanced functional materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 6.069
H-Index - 322
eISSN - 1616-3028
pISSN - 1616-301X
DOI - 10.1002/adfm.200304341
Subject(s) - materials science , x ray photoelectron spectroscopy , nanoparticle , aqueous solution , ionic bonding , chemical engineering , scanning electron microscope , covalent bond , nanotechnology , layer by layer , irradiation , fabrication , characterization (materials science) , layer (electronics) , organic chemistry , ion , chemistry , composite material , medicine , physics , alternative medicine , pathology , nuclear physics , engineering
Stable, ultrathin micropatterns containing CdS nanoparticles (CdS‐NPs) were fabricated in a two‐step process. In the first step, a precursor film was built‐up by the layer‐by‐layer electrostatic self‐assembly of photosensitive nitro‐diazoresin and mercaptoacetic acid capped CdS nanoparticles. In the second step, the film was selectively exposed to UV light through a photomask and developed in an aqueous solution of sodium dodecylsulfate (SDS). The formation of covalently linked micropatterns was based on the different solubilities of the irradiated and non‐irradiated parts of the film in the developer. Namely, the irradiated regions were cross‐linked and insoluble, whereas the non‐irradiated regions, linked with ionic bonds, were removed by the SDS solution. The resultant patterns were systematically characterized with atomic force microscopy, field emission scanning electron microscopy, optical microscopy, and X‐ray photoelectron spectroscopy.