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In Operando Monitoring by Analysis of Backscattered Electrons during Electron Beam Melting
Author(s) -
Arnold Christopher,
Böhm Jonas,
Körner Carolin
Publication year - 2020
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.201901102
Subject(s) - materials science , cathode ray , process (computing) , electron , optics , radiant intensity , intensity (physics) , signal (programming language) , radiation , optoelectronics , computer science , physics , quantum mechanics , programming language , operating system
Additive manufacturing by electron beam melting (EBM) is a complex process, which still lacks reliable tools for process monitoring. Demanding processing conditions such as high temperature, high vacuum, and X‐ray radiation impede the continuous operation of standard process monitoring devices such as light‐optical camera systems. To overcome this deficit, the detection of backscattered electrons (BSEs) is a highly promising approach. A detection system for BSEs is used for recording the in operando signal during melting inside an EBM system. The acquired data are postprocessed by mapping the data points to spatial coordinates. A comparison between the obtained intensity map and the as‐built surface shows a remarkable correlation, which might be suitable for process monitoring and quality control purposes.