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Chemical Vapor Deposition of Dense Hafnium Carbide from HfCl 4 –C 3 H 6 –H 2 System for the Protection of Carbon Fibers
Author(s) -
Kim Daejong,
Han Jangwon,
Park Chan,
Lee HyeonGeun,
Park Ji Yeon,
Kim WeonJu
Publication year - 2019
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.201800730
Subject(s) - materials science , hafnium , chemical vapor deposition , carbide , coating , deposition (geology) , carbon fibers , chemical engineering , yield (engineering) , mineralogy , analytical chemistry (journal) , composite material , metallurgy , nanotechnology , zirconium , composite number , organic chemistry , chemistry , paleontology , sediment , engineering , biology
Hafnium carbide (HfC) is studied as a promising material for aerospace application at ultra‐high temperatures. The protective HfC coating is deposited on carbon fiber at 1200 °C using a chemical vapor deposition method. Thermodynamic calculation is carried out to optimize process variables in the HfCl 4 –C 3 H 6 –H 2 system. H 2 partial pressure in the system has a significant effect on the yield, composition, and morphology of the HfC coating. When the ratio of H 2 /(HfCl 4 + C 3 H 6 ) is high, a single HfC phase with a porous structure is deposited because of the growth of HfC nanorods. On the other hand, a highly crystalline dense HfC, which contains a small amount excess carbon, is uniformly deposited on the carbon fiber woven fabric at a low H 2 /(HfCl 4 + C 3 H 6 ) ratio.