Premium
Complementary High Spatial Resolution Methods in Materials Science and Engineering
Author(s) -
Paris Oskar,
Lang David,
Li Jiehua,
Schumacher Peter,
Deluca Marco,
Daniel Rostislav,
Tkadletz Michael,
Schalk Nina,
Mitterer Christian,
Todt Juraj,
Keckes Jozef,
Zhang Zaoli,
FritzPopovski Gerhard,
Ganser Christian,
Teichert Christian,
Clemens Helmut
Publication year - 2017
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.201600671
Subject(s) - materials science , nanotechnology , synchrotron radiation , silicon , atom probe , microstructure , engineering physics , metallurgy , optics , physics
This review features the potential of modern high spatial resolution methods in materials science and engineering by presenting a selection of scientific examples covering bulk materials, as well as hard coatings, semiconductors, and mesoporous thin films. Complementary techniques are employed to study microstructure and/or texture and stresses in multiphase Mo‐, Al‐, and Mg‐base alloys, in several nitride‐ and boride‐based hard coatings, in silicon, as well as in mesoporous silica films. Although far from being comprehensive, the chosen examples aim at underlining the importance of modern electron microscopy based methods and of scattering/diffraction techniques at large scale neutron and synchrotron radiation facilities for modern materials research. In addition, atom probe tomography, Raman scattering and atomic force microscopy are also highlighted.