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Field‐Assisted Sintering Technology/Spark Plasma Sintering: Mechanisms, Materials, and Technology Developments
Author(s) -
Guillon Olivier,
GonzalezJulian Jesus,
Dargatz Benjamin,
Kessel Tobias,
Schierning Gabi,
Räthel Jan,
Herrmann Mathias
Publication year - 2014
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.201300409
Subject(s) - spark plasma sintering , materials science , sintering , nanocrystalline material , ceramic , plasma , field (mathematics) , materials processing , pulsed dc , engineering physics , mechanical engineering , metallurgy , nanotechnology , process engineering , thin film , sputter deposition , physics , mathematics , quantum mechanics , sputtering , pure mathematics , engineering
Field‐assisted sintering technology/Spark plasma sintering is a low voltage, direct current (DC) pulsed current activated, pressure‐assisted sintering, and synthesis technique, which has been widely applied for materials processing in the recent years. After a description of its working principles and historical background, mechanical, thermal, electrical effects in FAST/SPS are presented along with the role of atmosphere. A selection of successful materials development including refractory materials, nanocrystalline functional ceramics, graded, and non‐equilibrium materials is then discussed. Finally, technological aspects (advanced tool concepts, temperature measurement, finite element simulations) are covered.