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The Effect of Stress Relaxation on the Microstructure and Hardness Evolution of Pure Amorphous‐Carbon and C/Ti Multilayer Films
Author(s) -
Hong Chunfu,
Tu Jiangping,
Gu Changdong,
Zheng Xiaohua,
Liu Dongguang,
Li Ruiling,
Mao Scott X
Publication year - 2010
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.201000102
Subject(s) - materials science , microstructure , amorphous solid , bilayer , thin film , fluence , pulsed laser deposition , composite material , carbon film , stress relaxation , amorphous carbon , carbon fibers , relaxation (psychology) , crystallography , laser , optics , nanotechnology , membrane , composite number , psychology , social psychology , chemistry , physics , creep , biology , genetics
Pure amorphous‐carbon (a‐C) and C/Ti multilayer films are prepared by pulsed‐laser deposition. For each fluence (7 or 10 J cm −2 ), a‐C films are deposited with two durations (35 and 120 min) to vary the thickness. The thin films have an sp 3 bond ratio and hardness dependant on the fluence. The as‐deposited, thick a‐C films delaminate and provide a more‐nanosized graphitic microstructure, and a lower sp 3 bond ratio and hardness compared to thin a‐C films, correlating with stress relaxation of the films. The C/Ti multilayer films can be deposited at large thicknesses due to the low internal stress, while the sp 3 bond ratio and the hardness increase with decreasing thickness of the Ti bilayer.