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Improved Plasma Synthesis of Si‐nanopowders by Quenching
Author(s) -
Leparoux M.,
Schreuders C.,
Fauchais P.
Publication year - 2008
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200800217
Subject(s) - quenching (fluorescence) , materials science , plasma , silicon , nanoparticle , particle (ecology) , analytical chemistry (journal) , particle size , chemical engineering , nanotechnology , chemistry , metallurgy , chromatography , fluorescence , optics , physics , nuclear physics , engineering , oceanography , geology
Cold gas quenching has been investigated and optimized for the synthesis of silicon nanoparticles using an inductively coupled plasma process. A high symmetry quenching device with a funnel leads to particles with a two times higher specific surface area compared to non‐quenching conditions. Further decrease of the mean particle size down to 13 nm could be even achieved by quenching at a lower temperature position.
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