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Thermodynamic Assessment of the Alloy Concentration Limits for the Halogen Effect of TiAl Alloys
Author(s) -
Masset P. J.,
Schütze M.
Publication year - 2008
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/adem.200800057
Subject(s) - intermetallic , halogen , materials science , alloy , aluminium , metallurgy , aluminium alloy , base (topology) , layer (electronics) , composite material , chemistry , organic chemistry , alkyl , mathematics , mathematical analysis
By applying a well defined amount of halogen to the surface of intermetallic TiAl base alloys, their high temperature oxidation resistance can be improved significantly. The so‐called halogen effect consists in the preferential reaction of aluminium in the alloy with halogen, which gives rise to the formation of an almost pure alumina layer. The present study aims to provide a theoretical assessment of the Al concentration range where a positive effect is expected.